Degradación de fenol por proceso Haber-Weiss fotoinducido por luz visible con Tetracarboxifenilporfirina de cobre (ii) anclada al dióxido de titanio

Authors

DOI:

https://doi.org/10.15665/rp.v13i2.486

Keywords:

Radical hidroxilo, Porfirina, TiO2, Fenol.

Abstract

La degradación de fenol por radicales hidroxilo fue estudiada en solución acuosa. Las reacciones fueron realizadas en un sistema heterogéneo utilizando la tetra(4-carboxifenil)porfirina de cobre (II) adsorbida sobre dióxido de titanio (TCPPCu/TiO2) bajo radiación de luz visible. La TCPPCu/TiO2 fue caracterizada
por UV-Vis, IR y EPR. Se demostró la generación de radical hidroxilo a partir del sistema TCPPCu/TiO2/H2O2 en presencia de luz visible, midiendo la fluorescencia del 2-hidroxitereftalato disódico, producto de reacción entre el radical hidroxilo y el tereftalato disódico. Adicionalmente se estudió el efecto del pH sobre el proceso de foto-oxidación. La hidroquinona, catecol, y benzoquinona fueron identificadas por HPLC como los productos principales de la reacción de la fotooxidación. La oxidación
catalítica del fenol siguió una cinética global de pseudo-primer orden con una constante de velocidad igual a 0,0192 min-1.

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