Respuesta Fotoluminiscente observada en muestras de InP y GaAs no dopadas y dopadas Cr y S
DOI:
https://doi.org/10.15665/rp.v19i1.2439Abstract
In this work semiconductor sample of GaAs and InP doped and non-doped with a fast mapping equipment by photoluminescence at room temperature. The samples were gown by the LEC technique, with the photo luminescent technique the images were obtained and line spectrum to analyze the parameters: maximum wavelength peak, intensity of the maximum wavelength peak, the wide spectral in the middle of the maximum height (FWHM) and the integrated signal for all the samples. The spectrum of the not dope GaAs showed 2 peaks around 1,426 eV and another in 1,36 eV, which corresponds to superficial defect originated by the oxidation process of itself. The spectrum of the GaAs:Cr showed us a peak around 1,437, it did not present any defect zone when treated chemically, due to the presence of the Cr en el GaAs that originates an acceptor deep level located in 0,63 eV and under the conduction band. The spectrum of the InP:S showed a peak around the 1,375 eV and when it was treated chemically showed 2 peaks: 1,380eV with acetone and 1,392 eV with sulfuric acid.
References
M. De los Ríos, (2002) Estudio de la formación de defectos y colas de banda en muestras envejecidas de GaAs:Ge y AlGaAs:Sn por medio de la técnica de fotoluminiscencia. Tesis pregrado, Universidad del Quindío.
Z. Xiaolong., Z. Youwen, & S. Niefeng, “Study on the perfection of in situ P-injection synthesis LEC-InP single crystals”, Journal of Crystal Growth., 264 (1), 17-20, 2003.
K. Murata., H. Sano, Fukuyama. T. Kosugi., M. Nakamura., H. Sugahara., M. Tokumit-su., & T. Enoki, “InP-based IC technologies”, Thin Solid Films. 515, 4313–4320, 2007.
D. Cortés., G. Fonthal., M. De los Ríos., & H. Ariza, “Estudio por fotoluminiscencia del efecto de la impurificación en la formación de defectos para el GaAs dopado”, Revista Colombiana de Física. 43 (2), 532-535, 2011.
J. Wallentin, (2013) Doping of semiconductor nanowires. Doctoral thesis, Lund University.
E. Lugo., L. Rodríguez., L. Díaz, & D. Valdez, “Fabricación de diodo Schottky basado en GaAs para aplicaciones THz”, CNIES. TEL22, 1-5, 2015.
J. Leñero, “Materiales semiconductores y diagramas de bandas de energía”. En: Fundamentos de la electrónica y los semiconductores, editorial UCA, 15-22.
G. Fonthal, (2001) Estudio de la Impurificación de capas Epitaxiales de GaAs y AlGaAs en el rango de leve hasta fuerte dopaje, por medio de fotoluminiscencia y fotorreflectancia. Tesis Doctoral, Universidad del Quindío.
L. Pavesi, and M. Guzzi, Appl Phys. 75 (10), 4779, 1994.
F. Racedo, (2000) Crecimiento Epitaxial Selectivo de Estructuras Semiconductoras III-V. Tesis Doctoral, Universidad e católica, Rio de Janeiro Brasil.
N. H. Ky, and FK. Reinhart, Appl Phys 83 718, 1998.
Williams, E. W and Bebb, B, Semicductors and Semimetals, New York, Editorial Willardson, 1972, p 368.
C. Vargas., J. Agudelo, & D. G. Espinosa, “Estudios por fotoluminiscencia y Fotorreflectancia de Substratos de GaAs con y sin Tratamiento Químico”, Revista Colombiana de Física. 36 (2), 1-4, 2004.
B. Mendez, (2002) Estudio de la Naturaleza y Distribución de Defectos en Obleas de GaAs Mediante Técnicas de Inyecciones de Haces. Tesis Doctoral, Universidad Complutense de Madrid.
W.H. Koschel., S.G. Bishop, & B.D. McCombe, “Photoluminesce from deep Centers in GaAs”, Research Laboratory Washington, D.C. 20375, U.S.A. 19 521-524, 1976.
X. Wang, (2013) Growth and Characterization of Polycrystalline Indium Phosphide on Silicon. Master of Science Thesis, Royal Institute of Technology (KTH), Kista, Stockholm, Sweden.
Downloads
Published
Issue
Section
License
Copyright (c) 2021 francisco racedo, J. Jacome Mejia, S. E. Zambrano

This work is licensed under a Creative Commons Attribution-NonCommercial-NoDerivatives 4.0 International License.
The authors to publish in this journal agree to the following conditions:
- The authors transfer the copyright and give the the journal first publication right of the work registered with Creative Commons Attribution License, which allows third parties to use the published work on the condition of always mentioning the authorship and first publication in this journal.
- The authors may perform other independent and additional contractual arrangements for the non-exclusive distribution of the version of the article published in this issue (E.g., Inclusion in an institutional repository or publication in a book), it must be indicated clearly that the work was first published in this journal.
- It allows and encourages the authors to publish their work online (eg institutional or personal pages) before and during the review and publication process. It can lead to productive exchanges and greater and faster dissemination of the published work (see The Effect of Open Access)
Instructions to fill out Certificate of Originality and Copyright Assignment
- Click here and get the forms of Certificate of Originality and Copyright Assignment .
- In each field to fill out, click and complete the corresponding information.
- Once the fields are filled out, at the end of the form copy your scanned signature or digital signature. Please adjust the size of the signature on the form.
- Finally, you can save them as pdf files and send them through the OJS platform as an attachment.
